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Micro-manipulated
Cryogenic & Vacuum Probe
Systems
for Chips, Wafers and Device Testing
from ~3 K to 475 K

Probe Options
1. LOW FREQUENCY (DC). Tip
diameter, radius, and material can be specified by the user to match a specific
application and pad size.
1.1 CX: Coaxially shielded low
frequency probe with BNC feedthrough and 50 ohm coaxial cryogenic cable.
1.2 TX: Triaxially shielded low
frequency probe with triax feedthrough and 50 ohm triaxial cryogenic cable.
1.3 KEL: Kelvin probe,
available in either CX or TX configuration. The KEL probe includes two coaxial
or triaxial cryogenic cables joined at the probe holder, and wired to separate
BNC or triax feedthroughs. One cable is used for forcing current (or voltage)
through (or across) the device under test (DUT), and the other cable is used to
sense the voltage (or current) passing across (or through) the DUT. KEL probes
are typically used for low resistance measurements in order to eliminate cable
resistance from the measurement.
2. HIGH FREQUENCY.
2.1 MW: Microwave probes for
high frequency measurements. MW probes are available in 40, 50, and 67 GHz
ranges, and include low profile probe holders with beryllium copper or tungsten
spring loaded tips. The probe configuration and pitch can be specified by the
user, as ground-signal-ground (GSG), GS, or SG, with pitch range from 50 - 1250
microns. Each probe is connected to a semi-rigid coaxial cable terminating in a
type K or V connector designed for low insertion and low return loss.
3. FIBER OPTIC PROBE ARM.
One probe port can be configured to
accept an optical fiber, for precise optical excitation of wafers and devices.
JANIS RESEARCH COMPANY, INC.
2 Jewel Drive, P.O. Box 696
Wilmington, MA 01887-0696 USA
TEL: +1-978-657-8750 FAX: +1-978-658-0349
E-Mail: sales@janis.com
Policies
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